Influence of Annealing on Crystallinity of Electroless Ni-P Deposits

Authors

  • Winowlin Jappes J.T Kalasalingam University, Krishnankoil - 626 190, India
  • Ramamoorthy B Indian Institute of Technology, Madras - 600 036, India.
  • Kesavan Nair P Indian Institute of Technology, Madras- 600 036, India

Keywords:

Electroless nickel, Annealing, Crystallization, XRD, Profile Analysis.

Abstract

Electroless nickel is one of the widespread commercial and industrial coatings owing to its unique properties, such as good wear and corrosion resistance, thickness uniformity etc. The crystallinity of the deposits is one of the important factors which are influencing the properties. In this investigation, electroless Ni-P is deposited on mild steel substrate. The deposits were annealed at various temperatures for 2 hours. The crystallization process of these deposits was studied using single line profile analysis, employing pseudo-Voigt profile function. To de-convolute the overlapped reflections from different phases PRO-FIT software package was used. The data which are taken from the X-ray diffraction profile was used to find the crystallite size and microstrain using the in-house software ‘PROFAN’. The XRD reveals the formation Ni3P at and above 3000C. The amorphous phase becomes unstable and more or less disappears around 3600C which confirms the completion of recrystallization. The crystallite size increased sharply above 360°C, accompanied by a steep reduction in the microstrain, indicating the onset of precipitation. 

Downloads

Download data is not yet available.

References

A.Szasz (1987), “The initiation of electroless Ni-P coating”, Plating and surface finishing, 74, 116-121

A H Graham, R W Lindsay and H J Read (1965), “The structure and mechanical properties of electroless nickel”, Journal of Electrochemical Society, 112, 401-412.

Kazuyuki Sugita and Nobuo Ueno (1984), “Composition and Crystallinity of electroless nickel, Plating”, 131, 25-37.

C Ramesh Aggarwala and Subrata Ray (1992), “Crystallization Behaviour of Electroless Ni-P films part 1: magnetic moment study”, Z. Metallkd, 83,199 – 202.

I Bakoni, C Agnes, I Nagi and H Maria (1986), “Crystallization characteristics of electrodeposited amorphous Ni-P alloys”, Z.Metallkd, 77, 425-432.

S Ray, R C Agarwala (1988), “Variation of structure in Electrless Ni-P films with Phosphorous content”, Z. Metallkd, 79, 472-475.

J P Randin (1967), “DTA and XRD studies of ElectrolessNickel”,Journal of Electrochemical society, 114, 442-444.

Su Hoon Park and Dong Nyung Lee (1988), “A study on the microstructure and phase transformation of EN deposits”, Journal of material science 23, 1643-1654.

Sampath kumar and P.K. Nair (1996), “Studies on crystallization of Electroless Ni-P deposits”, Journal of materials Processing Technology, 56, 511-520.

S V S Tyagi, S K Barthwall, K Tondon and S Ray (1989), Annealing Behaviur of Electroless Non crystalline nickel phosphorous films, Thin solid films, 169, 229-233.

K T Shih, G D Jen and I C Yung (2004), “The influence of thermal treatment on the microstructure and hardness in electroless Ni–P–W deposit”, Thin Solid Films, 469-470, 333-338.

Sampath kumar (1994), “Studies on the structure, decomposition behaviour and properties of nickel based electroless deposits”, Ph.D Thesis, Indian Institute of Technology Madras, Chennai,.

E W Turns and J W Browning (1973), “Properties of Electroless Nickel coating on high strength steels”, Plating, 60, 463-467.

Sampath kumar and P.K.Nair (1994), “XRD studies on the relative proportion and composition of amorphous phase in electroless nickel deposits”, Nanocrystalline materials, 4, 183- 1981.

Downloads

Published

2008-09-01

How to Cite

[1]
“Influence of Annealing on Crystallinity of Electroless Ni-P Deposits”, JME, vol. 3, no. 3, pp. 126–136, Sep. 2008, Accessed: Dec. 22, 2024. [Online]. Available: https://smenec.org/index.php/1/article/view/629

Similar Articles

1-10 of 239

You may also start an advanced similarity search for this article.